Oxygen purification device

Product Introduction

The oxygen purification device uses a specially made catalyst, with industrial oxygen as the raw gas, to remove H2, CO, and hydrocarbons through a catalytic oxidation process; after cooling system, gas-water separator, and adsorption drying, H2O and CO2 are removed, with two towers working and regenerating alternately. This process cannot remove inert gas impurities such as nitrogen and argon from oxygen.

Technical Parameters

1. Processing gas volume: ?1~1500 Nm3/h (Non-standard equipment can be customized according to user needs)
2. Raw gas requirement: Industrial oxygen
3. Working pressure: 0.2-0.8MPa adjustable
4. (Oxygen purification device) Purification efficiency: After purification, it meets and exceeds the 99.9996% requirement of GB/T14599-2008

Equipment Features

1. The purifier adopts a special structure and loading method, with reasonable flow rate design and uniform airflow distribution; the catalyst of this purifier has high activity and the adsorbent has large capacity, thus resulting in lower operating costs.
2. Full BA-grade internally and externally drawn tubing. Uses imported ferrule-type ball valves. Eliminates re-contamination of gas flowing through the pipeline, ensures lifetime use after a single installation, truly achieving zero leakage and trouble-free operation;
3. Dual structure, one group works after startup, while the other regenerates and stands by. Moreover, the RZ-YYC series semi-automatic purification device operates and regenerates automatically, thus enabling continuous gas supply. One unit can be used as two single units. Fully automatic operation mode can also be customized according to customer needs;
4. Strong anti-fluctuation capability: Low requirements for raw oxygen, allowing impurity oxygen content up to 1000ppm. Therefore, users can achieve the requirements by using inexpensive industrial oxygen as the gas source;
5. Different processes can be economically adopted to meet customer needs based on the customer's raw gas specifications and product gas requirements.

Application Areas

This series of oxygen purification devices is suitable for major production departments such as semiconductors, optical fibers, transistors, and picture tubes that require a large amount of high-purity oxygen.